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5962R9570801TXC 查看數據表(PDF) - Intersil

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产品描述 (功能)
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5962R9570801TXC
Intersil
Intersil Intersil
5962R9570801TXC Datasheet PDF : 3 Pages
1 2 3
Die Characteristics
DIE DIMENSIONS:
(4166µm x 6350µm x 483µm ±25.4µm)
164 x 250 x 19mils ±1mil
METALLIZATION:
Type: Silicon - Aluminum
Thickness: 13.0kÅ ±2kÅ
SUBSTRATE POTENTIAL:
VDD
Metallization Mask Layout
HS-6617RH-T
BACKSIDE FINISH:
Silicon
PASSIVATION:
Type: Silox (SiO2)
Thickness: 8.0kÅ ±1kÅ
WORST CASE CURRENT DENSITY:
< 2.0e5 A/cm2
PROCESS:
SSAJIIV-RH
HS-6617RH-T
A2 (6)
(20) G
(19) A10
A1 (7)
A0 (8)
(18) E
All Intersil semiconductor products are manufactured, assembled and tested under ISO9000 quality systems certification.
Intersil semiconductor products are sold by description only. Intersil Corporation reserves the right to make changes in circuit design and/or specifications at any time with-
out notice. Accordingly, the reader is cautioned to verify that data sheets are current before placing orders. Information furnished by Intersil is believed to be accurate and
reliable. However, no responsibility is assumed by Intersil or its subsidiaries for its use; nor for any infringements of patents or other rights of third parties which may result
from its use. No license is granted by implication or otherwise under any patent or patent rights of Intersil or its subsidiaries.
For information regarding Intersil Corporation and its products, see web site http://www.intersil.com
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